Unlocking High-Gloss Perfection: Factors in Ceramic Tile Polishing

Here are several factors that contribute to the glossy finish on ceramic tiles:

Abrasive Selection: In the polishing process, a range of silicon carbide (SiC) abrasives with gradually decreasing grit sizes are commonly used. The grit sizes range from coarse to fine, such as from #320 to Lux grades. The use of these abrasives leads to a significant increase in gloss.

Polishing Tool Wear: The wear state of the polishing tool, indicated by the tool’s curvature, significantly affects the polishing outcome. New polishing tools, compared to worn ones, produce different polishing effects due to varying contact pressures. For instance, a decrease in tool curvature (due to wear) leads to increased contact pressure, thereby affecting gloss and material removal rate.

Polishing Efficiency: Polishing efficiency is defined as the ratio of tile wear rate to abrasive wear rate. This efficiency varies with different abrasive grit sizes and abrasive wear states. For example, with #320 grit abrasives, the highest abrasive curvature (lowest contact pressure) results in the highest polishing efficiency.

In summary, to achieve a high-gloss effect on ceramic tiles, it is necessary to select the appropriate abrasive grit size, control the wear state of the polishing tools, and optimize other parameters in the polishing process, such as pressure. These factors collectively influence the polishing outcome, including gloss, roughness, and material removal rate.

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